@article{oai:nagano-nct.repo.nii.ac.jp:00000499,
 author = {MATSUSHIMA, Hisao},
 journal = {長野工業高等専門学校紀要},
 month = {Dec},
 note = {application, Polycrystalline carbon films were prepared by photo-decomposition of acetylene under irradiation of UV light from the low pressure Hg lamp. The samples were characterized by electoron beam diffraction and scanning electoron mycroscope (SEM). The substrate temperature above 300℃ were necessary for obtaining polycrystalline carbon films. Recently, a great deal of attention has been forced on diamond or hard carbon films. These films have been obtained by thermal chemical vapour deposition (thermal CVD), plasma-enhanced chemical vapour deposition (Plasma CVD). Few papers have been described about carbon films deposited by photo-assisted method. In those studies, carbon films had amorphous structure. In this paper, polycrystalline carbon films were prepare by direct photo-decomposition of acetylene.},
 pages = {69--71},
 title = {Preparation of crystalline carbon films by Photo-CVD},
 volume = {20},
 year = {1989}
}