@article{oai:nagano-nct.repo.nii.ac.jp:00000830,
 author = {森山, 実},
 journal = {長野工業高等専門学校紀要, Memoirs of Nagano National College of Technology},
 month = {Jun},
 note = {Alumina film was deposited on several metallic and ceramic substrates by thermal decomposition of metal-organic compound (aluminum-isopropoxide) using thermal CVD to get a insulated ceramic film. The film was characterized by a electric conductivity, morphology observation using scanning electron microscope (SEM), diffraction pattern of X-ray and film thickness.},
 title = {CVD法を用いた絶縁性セラミックス膜の合成と特性評価},
 volume = {47},
 year = {2013}
}